FABulous investigates complimentary approaches for high resolution (<200nm), high speed (>2E7 voxels/s), multi-photon printing of 3D metasurfaces. The aim is to identify the optimum method for manufacturing metasurfaces with different applications.
Massively parallelised lithographic printing: This approach is based on massively parallelised lithographic printing which has been shown to enable writing of up to millions of voxels per exposure while reducing 3D proximity effects. Novel methods for multi-photon writing, based on the knowledge of existing parallel write technique using Spatial Light Modulators (SLM) and Diffractive Optical Elements (DOE), have been developed by IMTA with the aim of identifying the best engineering compromise for the numerous process parameters and constraints (write wavelength, available lasers, projection lens resolution and write field, resist sensitivity etc).
Robust testing found that the DOE approach is better suited to high-speed fabrication over large areas due to the energetic efficiency of the DOE, as this means that the system can withstand very high laser power, which enables large numbers of intense write spots to be used simultaneously. Using this approach, we have demonstrated fabrication of structures which are <200nm, at our target plot rate of 2E7 voxels/s, on flat surfaces. However, optimisation of the process to explore whether it is possible to achieve equivalent or even better performance on more complex surfaces is ongoing.






